Poster Program
Poster Session (Friday, Nov. 28)
At least one of the authors must stay in front of the poster during the assigned Core-Time:
(1) 11:10-12:00 † Odd number
(2) 12:00-12:50 ‡ Even number
Etching Technology
†P-11 Y. Kamaji
Study of process drift mechanism by metal by-product in Front End of Line (FEOL) process
‡P-12 T. Ishida
Improving Electric Characteristics of Pr1-xCaxMnO3 for ReRAM Devices in H2 Plasmas
†P-13 K. C. Yang
Magnetic Tunneling Junction Etched by Pulse Biasing at Low Frequency in Inductively Coupled Plasmas
‡P-14 T. Hayashi
Electronic Properties of HBr, O2 and Cl2 Used in Si Etching
†P-15 A. Matsutani
Microfabrication of 4H-SiC by Reactive Ion Etching Using XeF2 Plasma
Surface Reaction and Damage
†P-21 D. Ogawa
Effect of Liquid Nitrogen Cooling on GaN Film Exposed in Low Pressure Plasma
‡P-22 R. Kawakami
Morphological and Compositional Changes in AlGaN Surfaces Etched by RF Capacitively Coupled Carbon Tetrafluoride and Argon Plasmas
†P-23 S. Kaneko
Ion-induced Deformation of the Crystal Structure of Yttria-stabilized Zirconia and its Thermal Recovery
‡P-24 P. Nimnuan
Preparation and Performance of Nickel Oxide Thin Film Thermistor by Electrostatic Spray Deposition Technique
†P-25 M. Niibe
Etching Damage Analysis of n-GaN crystals etched with N2-plasma Using Soft X-ray Absorption Spectroscopy
‡P-26 S. Tajima
Anisotropic Chemical Dry Silicon Wafer Etching Using F2 + NO → F + FNO Reaction
Plasma Monitoring and Simulation
†P-31 Y. Kasashima
High-speed Load Impedance Monitoring System for Detection of Micro-arc Discharge
‡P-32 H. Matsuura
Size Optimization of Pt Catalytic Probe for Atmospheric Pressure Discharge Plasma
†P-33 Y. Matsuda
Gas Temperature Measurements in Inductively Coupled Plasma-assisted DC Magnetron Discharge by Tunable Diode Laser Absorption Spectroscopy
‡P-34 L. Z. Tong
Effects of Gas Composition, Focus Ring and Blocking Capacitor on Capacitively Coupled RF Ar/H2 Plasmas
†P-35 W. J. Brigg
Photoionization Cross Sections Using Quantemol-N
‡P-36 Y. Ohtsu
Spatial Profile of High-density Magnetized Capacitive Coupled Plasma with Ring-shaped Hollow Cathode
†P-37 S. Kogoshi
High Density and Low Electron Temperature Plasma Sustainment in Microwave Plasma Source with Slot Antennas
CVD/PVD/ALD
†P-41 M. Shimabayashi
Efficiencies of Reactive Nitrogen Species on Nitriding of SiC Surface by Irradiation of Remote Nitrogen Plasma
‡P-42 N. Nafarizal
Sticking Probability of Sulfur Atoms in Magnetron Sputtering CuZnSnS Plasma
†P-43 H. Ito
Production of CH(A2Δ) Radicals from the Dissociative Excitation Reaction of C2H2 with Microwave Discharge Flow of Ar
‡P-44 K. Takizawa
Effects of PBIID/PLD Combination Processes on Reducing Particles in DLC Films
†P-45 T. Kitajima
Surface Chemistry Control of Graphene for Hafnia ALD with Plasma Induced Radical Exposure
‡P-46 M. Tomatsu
Fabrication of Graphene-based Films Using Afterglow of Inductively Coupled Plasma
†P-47 H. Kinoshita
Field Electron-emission from Hydrogenated Amorphous CNx Films Formed on Al Films Using Supermagnetron Plasma Chemical Vapor Deposition
‡P-48 V. Mascariñas
Deposition of silver nanoparticles via Plasma Sputter-Type Negative Ion Source
Plasma Processes for New Applications
†P-51 D. Ogawa
Polymer Composites with Multi-walled Carbon Nanotubes Treated by Dielectric Barrier Discharge
‡P-52 K. Maruyama
Precise Control of Cooling Rate and Efficient Activation of Phosphorus Atoms in 4H-SiC wafer
†P-53 N. Hayashi
Gene Ontology Analysis of Plant Seeds Irradiated by Active Oxygen Species Generated in Oxygen Plasma
‡P-54 R. Ono
Optimization of Antioxidative Activity and Clarification of Growth Enhancement Effect of Plants Induced by Low-pressure RF Oxygen Plasma
†P-55 K. Matsui
Investigation on Mechanism of Sterilizing Microorganism Spores with Plasma-excited Neutral Gas
‡P-56 H. Yamada
Characteristic Measurements of a Minimally Invasive Plasma in a Gas Component Controlled Chamber
Atmospheric Pressure Plasma
†P-61 L. M. D. Rosario
Fast Low-energy Plasma Processing of a Tropical Hardwood for Enhanced Surface Properties
‡P-62 R. Tumlos
Microwave Atmospheric Plasma Devices for Enhancing Hydrophilicity of Surfaces
†P-63 A. E. J. C. Tinacba
A Study on the Correlation of Paint Adhesion to Surface Wetting and Roughness of Stainless Steel 304 Modified Using Microwave Atmospheric Plasma Jet
‡P-64 K. Yambe
Influence of Air Involution for Plasma Plume Length in Atmospheric Pressure Plasma
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