DPS2015 - 37th International Symposium on Dry Process

Nishizawa Award Lecture

• Prof. Kiyoshi Asakawa (University of Tsukuba)
  "Outstanding contribution to the progress of the plasma etching processes for compound materials."

Invited speakers and titles

• Dr. Sebastian Engelmann (IBM Thomas J. Watson Research Ctr.)
  "Improving high aspect ratio processes for logic applications through gas chemistry and plasma discharge optimization"
• Dr. Chris Lee (Lam Research Corporation)
  "Variability Control Using Atomic Layer Processing"
• Mr. Hirokazu Ueda (Tokyo Electron Ltd. )
  "Conformal doping using a radial line slot antenna microwave plasma source"
• Dr. Peter Ventzek (Tokyo Electron America, Inc.)
  ”Control of Atomic Layer Reactions for Plasma Processing”
• Dr. Ying Zhang (Applied Materials Inc.)
  "A New Frontier of Plasma Patterning: Atomic Layer Etch"