DPS2016 - 38th International Symposium on Dry Process

Nishizawa Award Lecture

• Prof. Hideo Sugai (Nagoya University)
  "Development of Basic Plasma Technology for Dry Process"

Invited speakers and titles

A1. How can we control atomic layer reactions ?（ALE/ALD）

• Prof. Jane P. Chang (UCLA)
  "Enabling the Synthesis and Integration of Multiferroic Materials by Atomic Layer Processing"
• Prof. Steven M. George (University of Colorado)
  "Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions"
• Prof. Erwin Kessels (The Eindhoven University of Technology)
  "Plasma-based atomic layer processing for nanoelectronics"

A2. Modeling and simulation for precise reaction control

• Prof. Hae June Lee (Pusan National University)
  "Fluid and Particle-in-Cell Simulations of the Capacitively Coupled Plasma Deposition Reactor"
• Dr. Stefan Tinck (University of Antwerp)
  ”Numerical and experimental investigation of cryogenic etching of silicon and porous low-k dielectric"
• Dr. Jung Hwan Anselmo Um (Samsung Electronics Co., Ltd.)
  "Analysis of ion energy and angular distribution at 300mm wafer edge using simulation and measured information"