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Scope
The 38th International Symposium on Dry Process (DPS2016) will be held at Conference Hall, Hokkaido University, Sapporo, Hokkaido, in Japan, on November 21 & 22, 2016.
The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.
Important dates
Abstract Submission Deadline: | July 15 July 29, 2016 |
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Early Registration Deadline: | October 14, 2016 |
Late Registration Deadline (Online): | November 7, 2016 |
Recent Updates
- Nov. 21, 2016 Submission deadline to JJAP extended to November 28, 2016.
- Nov. 8, 2016 On-line registration is Closed. On-site registration is available for those who would like to attend the DPS2016.
- Nov. 1, 2016 Presentation Guidelines and Poster Program opened
- Oct. 27, 2016 Timetable updated.
- Sep. 26, 2016 Timetable(Tentative) is available.
- Sep. 20, 2016 JJAP special issue On-Line Submission is opened.
- Aug. 31, 2016 Notification of abstract acceptance will be announced by the end of September, 2016.
- Jul. 8, 2016 Submission deadline extended to July 29, 2016.
- Jun. 27, 2016 On-Line Registration opened.
- Jun. 8, 2016 Updeted (News for the Special Issues of Japanese Journal of Applied Physics (JJAP)).
- May 18, 2016 On-Line Submission system is opened.
- Apr. 22, 2016 Invited Speakers and tentative titles opened.
- Feb. 15, 2016 DPS2016 website open.
News for the Special Issues of Japanese Journal of Applied Physics (JJAP).
- The deadline for submission to the Special Issue is November 28, 2016.
- The publication charge is 20000JPY/article.
https://journals.jsap.jp/jjap/special-issues/information - JJAP Special Issues is published in the web site(Free article);
DPS2015(Jpn. J. Appl. Phys. 55(6S2) June 2016)
http://iopscience.iop.org/issue/1347-4065/55/6S2
DPS2014(Jpn. J. Appl. Phys. 54(6S2) June 2015)
http://iopscience.iop.org/1347-4065/54/6S2
DPS2013(Jpn. J. Appl. Phys. 53 (3S2) March 2014)
http://iopscience.iop.org/1347-4065/53/3S2
News for Japanese members
応用物理学会プラズマエレクトロニクス分科会の協賛により、「第27回プラズマエレクトロニクス講習会」を 2016年11月28日(金)に東京大学 本郷(浅野)キャンパス 武田先端知ビル 「武田ホール」にて開催致します。
同講習会では、産業応用で必要とされる産業応用で必要とされるプロセスプラズマの生成、診断、制御の基礎と、その先端応用技術について、各分野にて第一線でご活躍の先生方より御講義頂く予定です。詳しくはこちら をご参照ください。
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