DPS 2019 41st International Symposium on Dry Process
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Theme/Topics/Arranged session
Theme
- Dry processes and related technologies from fundamentals to applications
Topics
- Etching Technologies
- Manufacturing Technologies (AEC, APC, EES, FDC)
- Surface Reaction and Damage
- Plasma Diagnostics and Monitoring Systems
- Modeling and Simulation
- Plasma Generation (Equipment/Source)
- Deposition Technologies (CVD / PVD)
- Atomic Layer Processes (ALD/ALE)
- Plasma Processes for 3D Device, FPD, Photovoltaic Devices
- Plasma Processes for New Material Devices (MRAM, Power, Organic)
- Plasma Processes for Biological and Medical application, MEMS
- Atmospheric Pressure Plasma and Liquid Plasma
- New Dry Process Concepts
Arranged session
- Novel Atomic Layer Etching and Atomic Layer Deposition approaches for advanced plasma process applications
- Advanced hardware and process development for overcoming High Aspect Ratio etching (AR>100)
- How AI and Deep Learning are transforming the plasma process?
In conjunction with