The 43rd International Symposium on Dry Process (DPS2022) will be held at Osaka International Convention Center, (Osaka, Japan) & Online from November 24 to 25, 2022. DPS2022 will be a hybrid symposium that will run in-person (number of attendees limited) and virtually. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.
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Please note that DPS2022 may go fully online depending on the COVID-19 situation.