Theme

• Dry processes and related technologies from fundamentals to applications

Topics

1. Etching Technologies
2. Manufacturing Technologies (AEC, APC, EES, FDC)
3. Surface Reaction and Damage
4. Plasma Diagnostics and Monitoring Systems
5. Computational Approaches (Modeling, Simulation, Machine Learning, AI, Informatics, DX) for Dry Process
6. Plasma Generation (Equipment/Source)
7. Deposition Technologies (CVD / PVD)
8. Atomic Layer Processes (ALD/ALE)
9. Dry process for Green Transformation:GX (Energy saving technology, Alternative gas, 3D-IC/Packaging)
10. Plasma Processes for New Material Devices (MRAM, Power, Organic)
11. Plasma Processes for Biological and Medical application, MEMS
12. Atmospheric Pressure Plasma and Liquid Plasma
13. New Dry Process Concepts

Arranged session

1. Challenges to limits for high aspect ratio etching
2. Novel control of surface reaction in atomic layer processes (ALE / ALD / Area selective ALD)
3. 3D-IC packaging for energy-saving and high-density interconnection