DPS2024 45th International Symposium on Dry Process

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Committee

Committee Chairpersons

  • Organizing Committee Chair: Masanobu Honda (TOKYO ELECTRON MIYAGI LTD.)
  • Executive Committee Chair: Kohki Satoh (Muroran Institute of Technology)
  • Program Committee Chair: Mitsuhiro Omura (KIOXIA Corp.)
  • Publication Committee Chair: Keigo Takeda (Meijo University)

Organizing Committee

Chair: M. Honda (TOKYO ELECTRON MIYAGI LTD.) Japan
Vice-chair: M. Matsui (Hitachi, Ltd.) Japan
H. Akatsuka (Tokyo Institute of Technology) Japan
K. Eriguchi (Kyoto University) Japan
N. Fujiwara (Mitsubishi Electric Corp.) Japan
M. Fukasawa (Advanced Industrial Science and Technology-AIST) Japan
S. Hamaguchi (Osaka University) Japan
H. Hayashi (Daikin Industries, Ltd.) Japan
S. Higashi (Hiroshima University) Japan
M. Hori (Nagoya University) Japan
T. Ichiki (The University of Tokyo) Japan
K. Ishikawa (Nagoya University) Japan
M. Jinno (Ehime University) Japan
K. Karahashi (Osaka University) Japan
K. Kinoshita (AIO Core Co., Ltd.) Japan
K. Koga (Kyushu University) Japan
H. Kokura (Tokyo Electron Ltd.) Japan
T. Koshizawa (Applied Materials Inc.) USA
K. Kurihara (KIOXIA Corp.) Japan
M. Kurihara (Hitachi, Ltd.) Japan
T. Maruyama (Renesas Electronics Corp.) Japan
Y. Morikawa (ULVAC Inc.) Japan
M. Nakatani (Panasonic Industry Corp.) Japan
T. Ohba (Lam Research Corp.) Japan
D. Ogawa (Chubu University) Japan
M. Omura (KIOXIA Corp.) Japan
K. Satoh (Muroran Institute of Technology) Japan
T. Shirafuji (Osaka Metropolitan University) Japan
M. Shiratani (Kyushu University) Japan
K. Takahashi (Kyoto Institute of Technology) Japan
K. Takeda (Meijo University) Japan
M. Terahara (Western Digital Corp.) Japan
H. Toyoda (Nagoya University) Japan
T. Watanabe (Waseda University) Japan

International Organizing Committee

O. Joubert (LTM/CNRS) FranceA. Agarwal (KLA Corp.) USA
S. Kundu (Interuniversity Microelectronics Center-IMEC) Belgium
W.M.M. Kessels (Eindhoven University of Technology) Netherlands
H.J. Lee (Pusan National University) Korea
K. C. Leou (National Tsing Hua University) Taiwan
T. Lill (Lam Research Corp.) USA
G. S. Oehrlein (University of Maryland) USA
L. Overzet (University of Texas at Dallas) USA
S. Shannon (North Carolina State University) USA
J.S. Wu (National Yang Ming Chiao Tung University) Taiwan
G-Y. Yeom (Sungkyunkwan University) Korea

Executive Committee

Chair: K. Satoh (Muroran Institute of Technology) Japan
Vice-chair: M. Jinno (Ehime University) Japan
Vice-chair: D. Ogawa (Chubu University) Japan
S. Kawaguchi (Muroran Institute of Technology) Japan
Y. Okuyama (National Institute of Technology, Tomakomai College) Japan
H. Sugawara (Hokkaido University) Japan
K. Takahashi (Muroran Institute of Technology) Japan

Publication Committee

Chair: K. Takeda (Meijo University) Japan
Vice-chair: K. Takahashi (Kyoto Institute of Technology) Japan
Vice-chair: K. Koga (Kyushu University) Japan
K. Ishikawa (Nagoya University) Japan
N. Kuboi (Sony Semiconductor Solutions Corp.) Japan
K. Kurihara (KIOXIA Corp.) Japan
S. Nunomura (Advanced Industrial Science and Technology-AIST) Japan
T. Ohta (Meijo University) Japan
K. Takenaka (Osaka University) Japan
H. Toyoda (Nagoya University) Japan

Program Committee

Chair: M. Omura (KIOXIA Corp.) Japan
Vice-chair: M. Kurihara (Hitachi, Ltd.) Japan
Vice-chair: T. Ohba (Lam Research Corp.) Japan
A. Abe (Sony Semiconductor Manufacturing Corp.) Japan
K.H. Bai (Samsung Electronics Co., Ltd.) Korea
J-P. Booth (CNRS/Ecole Polytechnique) France
R. L. Bruce (IBM Corp.) USA
Y. Daigo (Tokyo Electron Ltd.) Japan
E. Despiau-Pujo (CNRS/University of Grenoble Alpes) France
K. Doi (ULVAC Inc.) Japan
R. Dussart (CNRS/Université d'Orléans) France
D.J. Economou (University of Houston) USA
S. U. Englemann (IBM Corp.) USA
M. Fukasawa (Advanced Industrial Science and Technology-AIST) Japan
I. P. Ganachev (Shibaura Mechatronics Corp.) Japan
K. Hattori (Nagoya University) Japan
N. Hayashi (Kyushu University) Japan
T. Hayashi (Nagoya University) Japan
S. Higashi (Hiroshima University) Japan
M. Hiramatsu (Meijo University) Japan
M. Honda (TOKYO ELECTRON MIYAGI LTD.) Japan
T. Ichiki (The University of Tokyo) Japan
K. Ishikawa (Nagoya University) Japan
Y. Ishii (Hitachi High Technologies America, Inc.) USA
S. Kanakamedala (Western Digital Corp.) USA
S. Y. Kang (Samsung Electronics Co., Ltd.) Korea
K. Karahashi (Osaka University) Japan
K. Koga (Kyushu University) Japan
H. Kokura (Tokyo Electron Ltd.) Japan
H. Kondo (Kyushu University) Japan
A. Koshiishi (Samsung Electronics Co., Ltd.) Korea
T. Koshizawa (Applied Materials Inc.) USA
N. Kuboi (Sony Semiconductor Solutions Corp.) Japan
S. Kuboi (KIOXIA Corp.) Japan
K. Kurihara (KIOXIA Corp.) Japan
T. Maruyama (Renesas Electronics Corp.) Japan
M. Matsui (Hitachi, Ltd.) Japan
S. Miyazaki (Nagoya University) Japan
H. Miyazoe (IBM Corp.) USA
Y. Morikawa (ULVAC Inc.) Japan
M. Morimoto (Hitachi High-Tech Corp.) Japan
M. Nakamura (MAMO) Japan
A. Nelson (Quantemol Ltd.) UK
S. Nunomura (Advanced Industrial Science and Technology -AIST) Japan
S. Okita (Panasonic Smart Factory Solutions Co., Ltd.) Japan
M. Oryoji (Western Digital Corp.) Japan
E. Pargon (LTM-CNRS) France
F. Roozeboom (University of Twente) Netherlands
T. Seki (Kyoto University) Japan
Y. Setsuhara (Osaka University) Japan
P. Shen (Air Liquide Japan, Ltd.) Japan
Y. Shimogaki (The University of Tokyo) Japan
T. Shirafuji (Osaka Metropolitan University) Japan
M. Shiratani (Kyushu University) Japan
E. Stamate (Technical University of Denmark) Denmark
R. Suemitsu (Hitachi High-Tech Corp.) Japan
K. Takahashi (Kyoto Institute of Technology) Japan
K. Tapily (TEL Technology Center America) USA
M. Terahara (Western Digital Corp.) Japan
M. Titus (The University of Arizona) USA
H. Toyoda (Nagoya University) Japan
A. Tsuji (Tokyo Electron Ltd.) Japan
J. H. Um (Samsung Electronics Co., Ltd.) Korea
M. Yamada (Hitachi, Ltd.) Japan
G-Y. Yeom (Sungkyunkwan University) Korea

International Advisory Committee

Chair: T. Makabe (Keio University) Japan
S. Fujimura (Tokyo Institute of Technology) Japan
R. Gottscho (Lam Research Corp.) USA
J-G. Han (Sungkyunkwan University) Korea
M. Izawa (Hitachi High-Tech Corp.) Japan
K. Nojiri (Nanotech Research) Japan
K. Ono (Osaka University) Japan
H. Sugai (Nagoya University) Japan
K. Tachibana (Kyoto University) Japan
O. Takai (Kanto Gakuin University) Japan