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Scope
The 46th International Symposium on Dry Process (DPS2025) will be held at the Shiki Museum, Matsuyama, Ehime, Japan from November 13 to 14, 2025. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than four decades.
Important dates
| Abstract Submission Deadline: | July 14, 2025 |
| Notification of Abstract Acceptance: | |
| Early Registration Deadline: | |
| Late Registration Deadline (Online): | |
| Publish Proceedings (Abstracts): |
Recent Updates
- Feb. 05, 2025
- DPS2025 website open.
News for the Special Issues of Japanese Journal of Applied Physics (JJAP).
IF for the special issue of DPS in JJAP
1.67 (2017)
- The publication charge is 40000JPY/article.
https://iopscience.iop.org/journal/1347-4065/page/About - JJAP Special Issues is published in the web site;
DPS2023 (Jpn. J. Appl. Phys. 63 July 2024.) (Free until July 2025)
https://iopscience.iop.org/collections/jjap-240402-02
DPS2022 (Jpn. J. Appl. Phys. 62 July 2023.) (Free until July 2024)
https://iopscience.iop.org/issue/1347-4065/62/SI
DPS2021 (Jpn. J. Appl. Phys. 61 July 2022.)
https://iopscience.iop.org/issue/1347-4065/61/SI
DPS2019 (Jpn. J. Appl. Phys. 59 June 2020.)
https://iopscience.iop.org/issue/1347-4065/59/SJ
DPS2018 (Jpn. J. Appl. Phys. 58 June 2019.)
https://iopscience.iop.org/issue/1347-4065/58/SE
OPEN ACCESS & FREE ACCESS
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