DPS2025 46th International Symposium on Dry Process

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Keynote / Invited Speakers

Invited speakers and titles

AS1. Understanding the mechanisms for future high-aspect-ratio etching technology
  • Sung-Il Cho (Samsung Electronics Co., Ltd.)
    "Breaking new ground : From current progress to future innovations in HARC etching technology"
AS2. Atomic layer processes (ALE/ALD/ASD) for ultimate control of surface reaction
  • Christophe Vallee (University at Albany)
AS3. Dry process technology for 3D-IC and advanced packaging
  • Jeongsoo Kim (imec)
    "Dry etch process technology for 3D-IC and advanced packaging"