DPS 2020 42nd International Symposium on Dry Process

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Recipients of DPS2021 Nishizawa Award:

Masaru Hori
Professor
Nagoya University
Olivier Joubert
Director of research
CNRS

IMPORTANT CHANGE OF DPS2021

Due to the continuing travel restrictions related to the COVID-19 outbreak, DPS Organizing Committee made the difficult decision that The 42nd International Symposium on Dry Process (DPS2021) will be held as an ONLINE SYMPOSIUM from November 18th to 19th, 2021 JST.

Scope

The 42nd International Symposium on Dry Process (DPS2021) will be held as an ONLINE SYMPOSIUM from November 18th to 19th, 2021 JST. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etchsing and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than four decades.

Notice for DPS2021 ONLINE SYMPOSIUM Archive

Most of the oral presentation, the e-posters (the poster image) and the poster short presentation video will be available archive for streaming (not downloadable) in for about a week after the symposium, even if participation in real time is difficult.


 

Important dates

Abstract Submission Deadline: July 16 July 23, 2021
Early Registration Deadline: October 8, 2021
Receipt of registration fee Download Available: October 12, 2021
Publish Proceedings (Abstracts): November 11, 2021
Late Registration Deadline (Online): November 19, 2021

Recent Updates

Nov. 19, 2021
Submission deadline to JJAP extended to November 26, 2021.
Nov. 05, 2021
Online Presentation Manual & Instructions and Tips for Audience are available.
Nov. 3, 2021
JJAP special issue On-Line Submission is opened.
Nov. 2, 2021
Poster Program opened.
Oct. 18, 2021
Participant Portal is opened.
Oct. 13, 2021
Presentation Guidelines is opened.
Oct. 13, 2021
Timetable updated.
Oct. 12, 2021
Receipt of registration fee download at "My Page" is now available
Sep. 28, 2021
Timetable updated.
Sep. 07, 2021
Notification of abstract acceptance will be announced by the end of September, 2021.
Jul. 09, 2021
Submission deadline extended to July 23, 2021.
Jun. 28, 2021
On-Line registration opened.
Jun. 09, 2021
Timetable(Tentative) is available.
May. 10, 2021
On-Line Submission system is opened.
Apr. 15, 2021
IMPORTANT CHANGE: To be held as an ONLINE SYMPOSIUM
Jun. 24, 2020
Rescheduled to November 18 and 19, 2021.
Jun. 2, 2020
Postponed to 2021.
Feb. 3, 2020
DPS2020 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

IF for the special issue of DPS in JJAP

1.67 (2017)

OPEN ACCESS & FREE ACCESS

Regular Papers

DPS paper award that is given to excellent papers in the recent special issues of "Dry Process" and the articles are set "Open Access" for ever, or "Free Access" until December 2025.

DPS2020 DPS Paper Award: "Formation mechanism of sidewall striation in high-aspect-ratio hole etching"
M. Omura, J. Hashimoto, T. Adachi, Y. Kondo, M. Ishikawa, J. Abe, I. Sakai, H. Hayashi, M. Sekine, M. Hori
JJAP 58, SEEB02 (2019)

DPS2019 DPS Paper Award: "A method for high selective etch of Si3N4 and SiC with ion modification and chemical removal"
Sho Kumakura, Masahiro Tabata and Masanobu Honda
JJAP, 58(2019), SEEB01

DPS2018 DPS Paper Award: "Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate",
Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Masaru Kurihara, Tomoyuki Watanabe, Yutaka Kouzuma, Kenetsu Yokogawa, Satoshi Sakai, Masaru Izawa
JJAP, 56(2017), 06HB01

DPS2017 DPS Paper Award: "Highly selective etching of LaAlSiOx to Si using C4F8/Ar/H2 plasma",
Sasaki, Toshiyuki; Matsuda, Kazuhisa; Omura, Mitsuhiro; Sakai, Itsuko; Hayashi, Hisataka
JJAP, 54(2015), 06GB03

DPS2016 DPS Paper Award: "Plasma process induced physical damages on multilayered magnetic films for magnetic domain wall motion",
Kinoshita, Keizo; Honjo, Hiroaki; Fukami, Shunsuke; et al.
JAPP, 53(2014), 03DF03

DPS2015 DPS Paper Award: "Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors",
Eriguchi, Koji; Matsuda, Asahiko; Takao, Yoshinori; et al.
JJAP, 53(2014), 03DE02


Progress Reviews

"Rethinking surface reactions in nanoscale dry processes towardatomic precision and beyond: a physics and chemistry perspective"
Kenji Ishikawa, Tatsuo Ishijima, Tatsuru Shirafuji, Silvia Armini, Emilie Despiau-Pujo, Richard A. Gottscho, Keren J. Kanarik, Gert J. Leusink, Nathan Marchack, Takahide Murayama, Yasuhiro Morikawa, Gottlieb S. Oehrlein, Sangwuk Park, Hisataka Hayashi and Keizo Kinoshita
JJAP.58(2019), SE0801

"Progress and perspectives in dry processes for nanoscale featurefabrication: fine pattern transfer and high-aspect-ratio featureformation"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0802

"Progress and perspectives in dry processes for emergingmultidisciplinary applications: how can we improve our use of dry processes?"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0803

"Progress and perspectives in dry processes for leading-edgemanufacturing of devices: toward intelligent processes and virtualproduct development"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0804

"Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?”,
Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson and Keizo Kinoshita
JJAP.57(2018).06JA01


News for Japanese members

応用物理学会プラズマエレクトロニクス分科会の主催により、「第32回プラズマエレクトロニクス講習会」を 2021 年 11 月12 日(金) にZoom ウェビナーによるネット開催を致します。
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