Theme

• Dry processes and related technologies from fundamentals to applications

Topics

1. Etching Technologies
2. Manufacturing Technologies (AEC, APC, EES, FDC)
3. Surface Reaction and Damage
4. Plasma Diagnostics and Monitoring Systems
5. Computational Approaches(Modeling, Simulation and Machine Learning) for Dry Process
6. Plasma Generation (Equipment/Source)
7. Deposition Technologies (CVD / PVD)
8. Atomic Layer Processes (ALD/ALE)
9. Plasma Processes for 3D Device, FPD, Photovoltaic Devices
10. Plasma Processes for New Material Devices (MRAM, Power, Organic)
11. Plasma Processes for Biological and Medical application, MEMS
12. Atmospheric Pressure Plasma and Liquid Plasma
13. New Dry Process Concepts

Arranged session

1. Applications and Researches of Atomic Layer Controlled Etching and Deposition(ALE/ALD/Area Selective-ALD)
2. Challenges to Limits for High Aspect Ratio Etching
3. Rethinking of Cryogenic Etching